Introduction

Vacuum systems are an important part of many processing stations in a wafer fab. Vacuum is used to produce clean and contamination-free environments for deposition, removal, or modification of materials.

Wafer fab technicians need an understanding of vacuum technology and its relationship to manufacturing processes and process equipment. They need to measure, control, and analyze the vacuum process environments.

This report will provide guidelines for implementing a vacuum technology course as part of an associate of applied science program in semiconductor manufacturing. The report includes fifteen instructional modules. Each module descriptions contains a list of topics, student objectives, and a recommended number of class/lab hours.

The report also includes eleven laboratory experiments that support a technician level course in vacuum technology. The experiments range from simple pumpdown processes to the analysis of gas mixtures using a residual gas analyzer. All experiments can be performed using a high vacuum pumping station.

The course can be implemented as either a quarter length or semester length course, depending on the format of the instructional program.

References:

The following textbooks are referenced in the Course Content Section of this report:

A. Chambers, R. K. Fitch, and B.S. Halliday, Basic Vacuum Technology, Adam Hilger imprint by IOP Publishing Ltd. Techno House, 1989.

John F. O’Hanlon, A User’s Guide to Vacuum Technology, Second Edition, John Wiley & Sons, 1989.

---- , Basic Vacuum Practice, Third Edition, Varian Vacuum Products, 1992.